Abeam Technologies

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Description

TRAVIT is a software tool that is focused on simulation of CDs and CD variations; these are not being addressed by currently known models. An analytic model is used to simulate the dynamics of etch profiles. A GDSII pattern is taken as an input, an initial resist profile and etch parameters are given by the user; the software comes up with profiles for all layers as a function of time. The simulation can handle isotropic etch, anisotropic etch, and a combination of the two. Using etched profiles found by the software, it then extracts CD's and calculates CD-variation. Our goal has been to develop software for process engineers, rather than for research scientists. The only inputs the simulation software needs are about the type of pattern to be etched and process involved. The process engineer does not need a detailed knowledge and understanding of plasma physics, chemistry, or kinetics to run simulation.

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